Lab magnetron sputtering coating machine/ PVD vacuum coater system

FOB Reference Price:Get Latest Price
$18,000.00 - $32,000.00 / Unit | 1 Unit/Units (Min. Order)
Model Number:
CY-MSP300S-RFDC
Lead Time:
Quantity(Units) 1 - 1 >1
Est. Time(days) 30 Negotiable
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Overview
Quick Details
Condition:
New
Type:
Powder Coating Booth
Substrate:
metallic materials
Machine Type:
lab equipment
Coating:
Vacuum Coating
Place of Origin:
Henan, China
Brand Name:
CYKY
Voltage:
220V
Power(W):
2kw
Dimension(L*W*H):
1300*660*1200mm
Weight:
160KG
Certification:
CE
Key Selling Points:
Accurate temperature control
After Warranty Service:
Video technical support
Applicable Industries:
Manufacturing Plant
Local Service Location:
United States
Showroom Location:
United States
After-sales Service Provided:
No overseas service provided
Name:
Dual-head metal coating machine
Model No.:
CY-MSP300S-RFDC
Control:
LCD programmable control
Vacuum chamber:
O.D 300mm*300mm
Observation window:
100mm
Sample hoder size:
140mm Dia for 4" wafer
Temperature accuracy:
+/-1 C
Temperature range:
RT-500C
Outer size:
1300*660*1200mm
Warranty:
12 month
Supply Ability
Supply Ability:
20 Set/Sets per Month magnetron sputtering coater
Packaging & Delivery
Packaging Details
Plastic paper inside,polyfoam filled,wooden box outside
Port
zhenghzou
Lead Time :
Quantity(Units) 1 - 1 >1
Est. Time(days) 30 To be negotiated
Video Description

Lab magnetron sputtering coating machine/ PVD vacuum coater system 

Product Description

 

Dual-target magnetron sputtering coater (300W RF+500W DC)

 

The dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with a 500W DC power supply and a 300W RF power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal. The two targets can meet the needs of multi-layer or multiple coatings.

The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 10E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

 

Sample stage

Size

φ185mm

Temperature control accuracy

±1

Heating temperature

Max 500℃

Rotate speed

1-20rpm adjustable

Magnetron Sputtering target head

Quantity

2×2 (1”,2” optional)

Water chiller

Circulating water chiller with flow rate of 10L/min

Cooling mode

Water cooling

 

 

Vacuum chamber

Chamber size

φ300mm×300mm

Watch window

φ100mm

Chamber material

Stainless steel

Opening mode

Top cover open

Mass flowmeter

2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)

Vacuum system

Model

CY-GZK103-A

Pumping interface

KF40

Molecular pump

FJ-150

Exhaust interface

KF16

Front pole pump

VRD-4

Vacuum measurement

Compound vacuum gauge

Ultimate vacuum

10E-5Pa

Power supply

AC;220V 50/60Hz

Pumping rate

Molecular pump: 150L/S  rotary vane pump: 4L/S  Comprehensive gas pumping performance: vacuum up to 10E-3Pa in 20 minutes

Power configuration

Quantity

DC power supply×1

RF power supply×1

Max output power

DC 500W, RF 300 W

Other parameters

Supply voltage

AC220V,50Hz

Overall size

600mm×650mm×1280mm

Total power

2.5KW

Total Weight

300kg

Ultimate vacuum

10E-5Pa

 

 

 

Pictures of Vacuum Sputtering Machine

 

Packing list

 

 Item name Quantity
 DC power control system 1 set
 RF power control system 1 set
 Film thickness monitoring system 1 set
 Vacuum pump 1 set
 Water chiller 1 set
 Cooling pipe 1 set
 Target Stainless steel 1pc; Ceramic 1 pc

 

Company Information

Company Description:

Zhengzhou CY Scientific Instrument Co., Ltd is a professional high- tech enterprise,it has 20 years history of R&D,manufacture and sales in advanced materials.Many products are awarded as high-tech products and obtain patents.

 

Mainly products:

Muffle furnace

Atmosphere furnace

Tube furnace

Dental sintering furnace

Vacuum furnace

Crucible furnace

Bottom loading furnace

Car bottom furnace

Etc.

  

 

Our Services

 Payment

 

T/T, L/C, WEST UNION, PAYPAL, ESCROW AND ETC

Warranty

 

Main product is 15 month, except wearing parts. 

 

Related Products

 

contact information

Pamela
Manager-Sales
ZHENGZHOU CY SCIENTIFIC INSTRUMENT CO.,LTD
Add:Room 820,# 9bld, 863 software park,Hi-techzone,Zhengzhou,China
Tel: 86-13253655998
Skype:Pamela945 CYKY
Wechat:13253655998
Fax: 86-0371-86036875